Gas purifier for moisture removal and used for semiconductor fabrication
Suitable for electronic semiconductor, large scale integrated circuit, MAMS, monocrystalline silicon polycrystalline silicon and silicon epitaxy, LED, TFT, gallium nitride, silicon carbide, scientific research and development, experimental analysis, etc.
Characteristics
● Suitable for nitrogen, hydrogen, oxygen, argon, helium and ammonia. The raw gas is not less than 99.999%. ● Deep removal of impurities O2, H2O, CO, CO2, H2, N2, CH2 and NMHC to 1ppB / 10ppB. ● Double tower alternate adsorption regeneration, single tower catalysis, terminal Getter adsorption, automatic continuous operation. ● EP class 316L polished stainless steel pipe fittings. ● With 0.003 m filter, removal rate can reach 99.999999% /99.99999%. ● Siemens PLC can be connected to DCS system. ● The security alarm function is perfect. ● Remote cloud service is available. ● Production and assembly in a super clean environment. ● Gas capacity 10-20000nm3 /h. |  |
