
Ultra high purity Gas Purifier/Purification System/Generator
Application areas: electronic semiconductors, large-scale integrated circuits, MAMS, monocrystalline silicon polycrystalline silicon and silicon epitaxy, LED, TFT, gallium nitride, silicon carbide, scientific research and development, experimental analysis, etc.
Ultra high purity Gas Purifier/Purification System/Generator
Characteristics
● Two towers alternate adsorption regeneration, automatic continuous operation. | ![]() |
Table Parameters
Series models | For gas | Raw gas index | Product gas index | |||||||||||
N2 | H2 | O2 | Ar | He | O2 | H2O | CO2 | CO | CH4 | H2 | N2 | Granularity | ||
9VV | ● | ● | ● | ● | ● | 5N | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | — | ≤0.1ppb | — | 0.003μm |
9OVV | ● | — | ● | ● | ● | 5N | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | — | 0.003μm |
9VVX | — | — | — | ● | ● | 5N | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | 0.003μm |
— | ● | — | — | — | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | — | ≤0.1ppb | 0.003μm | ||
9X | — | — | — | ● | ● | 5N | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | 0.003μm |
— | ● | — | — | — | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | ≤0.1ppb | — | ≤0.1ppb | 0.003μm | ||
Note: Common flow specifications:1-20000Nm3/h;Commonly used pressure:1-20Mpa |